Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device
AssigneeFUJIFILM Corporation
InventorsMichihiro Shirakawa, Hajime Furutani, Hironori Oka
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AssigneeFUJIFILM Corporation
InventorsMichihiro Shirakawa, Hajime Furutani, Hironori Oka
Estimating the term…
A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Requirements 1 to 3, Requirement 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127) Formula(1) Requirement 2: The concentration of solid contents in the photosensitive composition for EUV light is 5.0% by mass or less, Requirement 3: The content of the photoacid generator is 5% to 50% by mass with respect to the total solid content in the photosensitive composition for EUV light.
A photosensitive composition for EUV light, comprising:
A photosensitive composition for EUV light, comprising:
Dependencies are inferred from the claim text.