Nano-dynamic biosensor and fabrication method therefor

A fabrication method for a biosensor, comprising:

• applying a photoresist on an insulating substrate;
• exposing a first surface of the insulating substrate, etching the photoresist, and then forming an electrode;
• forming a pattern for manufacturing a membrane on a second surface of the insulating substrate;
• forming the membrane on the first surface by an etching process and solvent treatment on the second surface of the insulating substrate;
• removing the formed membrane;
• stacking a graphene-polymer layer on a hollow structure formed at a portion from which the membrane of the first surface is removed, wherein the graphene-polymer layer is exactly placed on the hollow structure while checking the location of the graphene-polymer layer relative to the hollow structure;
• curing the graphene in the graphene-polymer layer by heat treatment of the graphene at 30-70° C. to fix the graphene on the hollow structure;
• further heat treating the graphene-polymer layer to at least 180° C. to remove the polymer from the graphene-polymer layer, thereby leaving a cured graphene layer;
• subjecting the cured graphene to oxygen plasma treatment to further fix and immobilize the cured graphene layer on the hollow structure without gaps;
• forming a resonance unit by treating a surface exposed to an outside of the graphene layer with a surface treatment agent containing a functional group;
• and
• coupling a detection unit to the resonance unit including the functional group, and
• wherein the insulating substrate has a SiO2 layer and a SiNx layer which are sequentially stacked on both surfaces of the insulating substrate, and x is a real number between 1 and 5, and
• wherein an inner area of the hollow structure is 6.0×102 μm2 to 6.3×102 μm2.