Display substrate, method for manufacturing the same and display device

A method for manufacturing a display substrate, comprising:

• providing a base substrate;
• forming a first conductive line extending in a first direction on the base substrate;
• forming an insulation layer covering the first conductive line on the base substrate;
• and
• forming a second conductive line extending in a second direction crossing the first direction on the insulation layer,
• wherein prior to forming the first conductive line extending in the first direction on the base substrate, the method further comprises:
• forming a buffer material layer on the base substrate;
• and etching the buffer material layer to form a buffer layer comprising a groove extending in the first direction,
• wherein the forming the first conductive line extending in the first direction on the base substrate comprises forming the first conductive line in the groove in such a manner that a surface of the first conductive line away from the base substrate is flush with a surface of the buffer layer away from the base substrate;
• wherein prior to forming the buffer material layer on the base substrate, the method further comprises:
• forming a support material layer on the base substrate;
• and etching the support material layer to form a support pattern;
• wherein the support pattern is a conductive pattern;
• wherein the etching the buffer material layer to form the buffer layer comprises:
• etching the buffer material layer to form the buffer layer in such a manner that an orthogonal projection of the support pattern onto the base substrate is located within an orthogonal projection of the groove onto the base substrate.