Substrate processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorsTomohiro Takahashi, Kei Takechi, Mitsutoshi Sasaki, Takashi Akiyama
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AssigneeSCREEN Holdings Co., Ltd.
InventorsTomohiro Takahashi, Kei Takechi, Mitsutoshi Sasaki, Takashi Akiyama
Estimating the term…
A substrate processing device includes a processing tank, a substrate holding unit, a fluid supply unit, and a control unit. The processing tank stores a processing liquid for processing a substrate. The substrate holding unit holds the substrate in the processing liquid in the processing tank. The fluid supply unit supplies a fluid to the processing tank. The control unit controls the fluid supply unit. The control unit controls the fluid supply unit such that the fluid supply unit changes supply of the fluid during a period from a start of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed to an end of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed.
A substrate processing method comprising:
Dependencies are inferred from the claim text.