Fluorine based molecular co-gas when running dimethylaluminum chloride as a source material to generate an aluminum ion beam

A system for implanting aluminum ions into a workpiece, the system comprising:

• an ion source comprising:
• an arc chamber comprising one or more electrodes operably coupled to an electrode power supply, wherein the arc chamber further comprises an extraction aperture;
• a process gas source containing dimethylaluminum chloride (DMAC);
• a process gas supply line fluidly coupling the process gas source to the arc chamber, wherein the process gas supply line is configured to selectively transfer the DMAC from the process gas source to the arc chamber, wherein the one or more electrodes are configured to form a plasma from the DMAC within the arc chamber based, at least in part, on an energy provided to the electrode from the electrode power supply, thereby decomposing the DMAC to form at least C2H3 having a mass approximating atomic aluminum;
• a co-gas source containing a co-gas comprising fluorine;
• and
• a co-gas supply line fluidly coupling the co-gas source to the arc chamber, wherein the co-gas supply line is configured to selectively transfer the co-gas from co-gas source to the arc chamber, wherein the co-gas supply line is distinct from the process gas supply line, and wherein the fluorine is configured to react with at least the C2H3, thereby forming CFx and minimizing an amount of C2H3 available within the arc chamber;
• an extraction electrode proximate to the extraction aperture of the arc chamber, wherein the extraction electrode is configured to extract an aluminum-based ion beam from the arc chamber based on a biasing of the extraction electrode with respect to the arc chamber;
• and
• a mass analyzer positioned downstream of the extraction aperture, wherein the mass analyzer is configured to mass analyze the aluminum-based ion beam and remove the CFx, thereby defining a mass analyzed aluminum ion beam, whereby energetic cross-contamination due to C2H3 in the mass analyzed aluminum ion beam is minimized.

A system for implanting aluminum ions into a workpiece, the system comprising:

• an ion source comprising:
• an arc chamber comprising an extraction aperture;
• one or more electrodes electrically coupled to an electrode power supply;
• a ceramic target positioned within the arc chamber, wherein the ceramic target comprises aluminum;
• a process gas source containing dimethylaluminum chloride (DMAC) in a liquid form;
• a process gas supply line fluidly coupling the process gas source to the arc chamber, wherein the process gas supply line is configured to selectively transfer the DMAC from the process gas source to the arc chamber in a gaseous form, wherein the one or more electrodes are configured to form a plasma from the DMAC within the arc chamber based, at least in part, on an energy provided to the one or more electrodes from the electrode power supply, thereby decomposing the DMAC to form at least C2H3 having a mass approximating atomic aluminum;
• a co-gas source containing a co-gas comprising fluorine;
• and
• a co-gas supply line fluidly coupling the co-gas source to the arc chamber, wherein the co-gas supply line is configured to selectively transfer the co-gas from co-gas source to the arc chamber, wherein the co-gas supply line is distinct from the process gas supply line, and wherein the fluorine is configured to react with at least the C2H3, thereby forming CFx and minimizing an amount of C2H3 available within the arc chamber, and wherein the fluorine is configured to etch the ceramic target;
• an extraction electrode proximate to the extraction aperture of the arc chamber, wherein the extraction electrode is configured to extract an aluminum-based ion beam from the arc chamber based on a biasing of the extraction electrode with respect to the arc chamber;
• and
• a mass analyzer positioned downstream of the extraction aperture, wherein the mass analyzer is configured to mass analyze the aluminum-based ion beam and remove the CFx, thereby defining the aluminum ion beam, whereby energetic cross-contamination due to C2H3 in the aluminum ion beam is minimized.