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US 11,698,648 B2Granted
Gas supply system and gas supply method
AssigneeTokyo Electron Limited
InventorsAtsushi Sawachi, Norihiko Amikura
Life of this patent
Estimating the term…
Abstract
A gas supply system includes a first flow channel connected to a first gas source of a first gas, formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes, a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes, and a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole to correspond to the first gas discharge hole.
Claims8
A gas supply system configured to supply a gas to a treatment space within a treatment container of a substrate treatment apparatus, the system comprising:
- a first flow channel connected to a first gas source of a first gas, formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes;
- a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes;
- a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole;
- a plurality of second diaphragm valves, wherein each of the second diaphragm valves is provided between the second flow channel and the second gas discharge hole;
- a controller configured to bring the plurality of first diaphragm valves and the plurality of second diaphragm valves into operation;
- a first pressure detector configured to measure a pressure of a first mixed gas supplied to the first flow channel;
- and
- a second pressure detector configured to measure a pressure of a second mixed gas supplied to the second flow channel, wherein
- the controller:
- brings each of the first diaphragm valves into operation so that a flow rate of the first mixed gas within the first flow channel is distributed and controlled for each of the first gas discharge holes,
- brings each of the second diaphragm valves into operation so that a flow rate of the second mixed gas within the second flow channel is distributed and controlled for each of the second gas discharge holes,
- controls degrees of opening of the plurality of first diaphragm valves on the basis of a relationship between a flow rate, a pressure and a degree of valve opening acquired in advance for each of the first gas discharge holes, a measurement result of the first pressure detector, and a target flow rate which is set for each of the first gas discharge holes, and
- controls degrees of opening of the plurality of second diaphragm valves on the basis of a relationship between a flow rate, a pressure and a degree of valve opening acquired in advance for each of the second gas discharge holes, a measurement result of the second pressure detector, and a target flow rate which is set for each of the second gas discharge holes.
10 more elements
A gas supply method in a gas supply system that supplies a gas to a treatment space within a treatment container of a substrate treatment apparatus,
- wherein the gas supply system includes:
- a first flow channel connected to a first gas source of a first gas, and formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes,
- a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes,
- a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole, and
- a plurality of second diaphragm valves, wherein each of the second diaphragm valves is provided between the second flow channel and the second gas discharge hole,
- a controller configured to bring the plurality of first diaphragm valves and the plurality of second diaphragm valves into operation,
- a first pressure detector configured to measure a pressure of a first mixed gas supplied to the first flow channel, and
- a second pressure detector configured to measure a pressure of a second mixed gas supplied to the second flow channel, wherein
- the controller:
- brings each of the first diaphragm valves into operation so that a flow rate of the first mixed gas within the first flow channel is distributed and controlled for each of the first gas discharge holes,
- brings each of the second diaphragm valves into operation so that a flow rate of the second mixed gas within the second flow channel is distributed and controlled for each of the second gas discharge holes,
- controls degrees of opening of the plurality of first diaphragm valves on the basis of a relationship between a flow rate, a pressure and a degree of valve opening acquired in advance for each of the first gas discharge holes, a measurement result of the first pressure detector, and a target flow rate which is set for each of the first gas discharge holes, and
- controls degrees of opening of the plurality of second diaphragm valves on the basis of a relationship between a flow rate, a pressure and a degree of valve opening acquired in advance for each of the second gas discharge holes, a measurement result of the second pressure detector, and a target flow rate which is set for each of the second gas discharge holes,
- the gas supply method comprises:
- setting each of the first diaphragm valves to be opened and each of the second diaphragm valves to be closed, and supplying the first gas from the first gas discharge hole to the treatment space;
- and
- setting each of the first diaphragm valves to be closed and each of the second diaphragm valves to be opened, and supplying the second gas from the second gas discharge hole to the treatment space.
14 more elements
Dependencies are inferred from the claim text.