Imaging system comprising beam guidance element with high solarization resistance in the visible spectral range
AssigneeSchott AG
InventorsRalf Jedamzik, Peter Naß, Sebastian Leukel, Volker Hagemann, Uwe Petzold
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Abstract
An imaging system includes at least one laser light source having a wavelength in the visible spectral range and a beam guidance element with high solarization resistance at high beam power densities. The invention also relates to the use of the imaging system, in particularly in projectors and in material processing.
Claims14
An imaging system, comprising:
- at least one laser light source selected from the group consisting of a laser light source B having a wavelength λB in the spectral range of 380 nm to 490 nm, a laser light source G having a wavelength λG in the spectral range of >490 nm to 585 nm, and a laser light source R having a wavelength λR in the spectral range of >585 nm to 750 nm;
- and
- a beam guidance element, wherein the laser light source is suitable to generate in at least one point of the beam guidance element a mean surface power density of more than 10 W/cm2, and the beam guidance element consists of a glass having a quality factor F(436 nm)=S(436 nm)*(Ext0(436 nm)+Ext1(436 nm))/k, wherein S(436 nm) is a thermality at a wavelength of 436 nm, Ext1(436 nm) is an additional absorbance in comparison to Ext0(436 nm) at a wavelength of 436 nm of a sample having a thickness of 10 mm after an irradiation of 15 hours with a HOK 4 lamp, Ext0(436 nm) is an absorbance at a wavelength of 436 nm of a sample having a thickness of 10 mm without irradiation with a HOK 4 lamp, and k is a thermal conductivity, and wherein F(436 nm) is <700 ppm/W.
A beam guidance element, consisting of a glass having a quality factor F(436 nm)=S(436 nm)*(Ext0(436 nm)+Ext1(436 nm))/k, wherein S(436 nm) is a thermality at a wavelength of 436 nm, Ext1(436 nm) is an additional absorbance in comparison to Ext0(436 nm) at a wavelength of 436 nm of a sample having a thickness of 10 mm after an irradiation of 15 hours with a HOK 4 lamp, Ext0(436 nm) is an absorbance at a wavelength of 436 nm of a sample having a thickness of 10 mm without irradiation with a HOK 4 lamp, and k is a thermal conductivity, wherein F(436 nm) is <700 ppm/W.
A glass having a quality factor F(436 nm)=S(436 nm)*(Ext0(436 nm)+Ext1(436 nm))/k, wherein S(436 nm) is a thermality at a wavelength of 436 nm, Ext1(436 nm) is an additional absorbance in comparison to Ext0(436 nm) at a wavelength of 436 nm of a sample having a thickness of 10 mm after an irradiation of 15 hours with a HOK 4 lamp, Ext0(436 nm) is an absorbance at a wavelength of 436 nm of a sample having a thickness of 10 mm without irradiation with a HOK 4 lamp, and k is a thermal conductivity, wherein F(436 nm) is <700 ppm/W.
A projector, comprising:
- an imaging system comprising:
- at least one laser light source selected from the group consisting of a laser light source B having a wavelength in the spectral range of 380 nm to 490 nm, a laser light source G having a wavelength λG in the spectral range of >490 nm to 585 nm, and a laser light source R having a wavelength λR in the spectral range of >585 nm to 750 nm;
- and
- a beam guidance element, wherein the laser light source is suitable to generate in at least one point of the beam guidance element a mean surface power density of more than 10 W/cm2, and the beam guidance element consists of a glass having a quality factor F(436 nm)=S(436 nm)*(Ext0(436 nm)+Ext1(436 nm))/k, wherein S(436 nm) is a thermality at a wavelength of 436 nm, Ext1(436 nm) is an additional absorbance in comparison to Ext0(436 nm) at a wavelength of 436 nm of a sample having a thickness of 10 mm after an irradiation of 15 hours with a HOK 4 lamp, Ext0(436 nm) is an absorbance at a wavelength of 436 nm of a sample having a thickness of 10 mm without irradiation with a HOK 4 lamp, and k is a thermal conductivity, and wherein F(436 nm) is <700 ppm/W.
Dependencies are inferred from the claim text.