Mechanism for creating vacuum in processing apparatus
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYung-Syuan Lan, Chia-Wei Chen
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYung-Syuan Lan, Chia-Wei Chen
Estimating the term…
A processing apparatus is provided. The processing apparatus includes a processing chamber, a pump, and an intersecting module. The process chamber has a gas outlet. The pump communicates with the gas outlet. The pump is configured to exhaust gas from the processing chamber via the gas outlet. The intersecting module is positioned between the pump and the gas outlet. The intersecting module includes a plurality of support members and a plurality of internal ventilating plates. The support members are arranged along a longitudinal direction. Each of the internal ventilating plates has a plurality of orifices. At least one of the internal ventilating plates is positioned between two of the support members positioned adjacent to each other in the longitudinal direction. Each of the internal ventilating plates is inclined relative to a transversal direction that is perpendicular to the longitudinal direction.
An intersecting module, comprising:
An intersecting module, comprising:
An intersecting module, comprising:
Dependencies are inferred from the claim text.