Fluorinated ether composition for vapor deposition, and article with vapor-deposited film and method for its production
AssigneeAGC Inc.
InventorsKenji Ishizeki, Hideyuki Hirakoso
Life of this patent
Estimating the term…
Abstract
To provide a fluorinated ether composition for vapor deposition which can be used to form a vapor-deposited film excellent in frictional durability, and an article with a vapor-deposited film and a method for its production. This fluorinated ether composition for vapor deposition comprises a compound (A) having a poly(oxyperfluoroalkylene) chain and a hydrolyzable silyl group, and a partial condensate (B) of the compound (A), wherein the proportion of the partial condensate (B) to the total amount of the compound (A) and the partial condensate (B) is from 4 to 40 mass %.
Claims10
A fluorinated ether composition comprising a compound (A) having a poly(oxyperfluoroalkylene) chain and b groups (where b is an integer of 1 or more) each represented by the following formula (I), and a partial condensate (B) of the compound (A), characterized in that the proportion of the partial condensate (B) to the total amount of the compound (A) and the partial condensate (B) is from 4 to 40 mass %,
- —SiRnL3−n (I)
- where L is a hydroxy group or a hydrolyzable group,
- R is a hydrogen atom or a monovalent hydrocarbon group,
- when b is an integer of at least 2, n is an integer of from 0 to 2, and when b is 1, n is 0 or 1,
- when n is 0 or 1, (3-n) L may be the same or different,
- when n is 2, n R may be the same or different,
- wherein the number average molecular weight of the compound (A) is from 2,000 to 10,000, and
- wherein the number average molecular weight of the partial condensate (B) is from 4,000 to 30,000.
Dependencies are inferred from the claim text.