Method and system for providing ultrapure water with flexible lamp configuration
AssigneeEvoqua Water Technologies LLC
InventorsChristopher Hall, Bruce Lee Coulter
Life of this patent
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Abstract
A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.
Claims11
A method of treating water comprising:
- Providing water to be treated;
- Measuring a total organic carbon (TOC) value of the water to be treated;
- Introducing persulfate anions to the water to be treated based in part on at least one input signal of the measured TOC value of the water to be treated;
- Introducing the water containing persulfate anions to a primary reactor;
- Exposing the persulfate anions in the water to ultraviolet light in the reactor to produce an irradiated water stream;
- Providing an electronic ballast circuit including a resonant tank circuit having a power output operatively coupled to the ultraviolet light, the electronic ballast circuit operable to control the continuously variable intensity of the ultraviolet light over a continuous range of power levels by continuously measuring the current supplied to the ultraviolet light and adjusting a frequency of a drive voltage supplied to the resonant tank circuit responsive to at least one input signal from the measured TOC value;
- Wherein the electronic ballast circuit controls the continuously variable intensity of the ultraviolet light to provide sufficient power to the ultraviolet light to remove a desired amount of TOC from fluid undergoing treatment while not producing more ultraviolet radiation than is necessary to remove the desired amount of TOC;
- and
- Adjusting the continuously variable intensity of the ultraviolet light based in part on at least one of an input signal selected from the group consisting of a TOC value of the water to be treated, a persulfate value of the water downstream of the reactor, and a rate of addition of persulfate anions.
A method of providing ultrapure water to a semiconductor fabrication unit, comprising:
- Providing inlet water having a TOC value of less than about 25 ppb;
- Introducing at least one free radical precursor compound into the water;
- Converting the at least one free radical precursor compound into at least one free radical scavenging species by exposing the at least one free radical precursor to UV radiation from a source of UV radiation having a continuously variable UV radiation power output;
- Providing an electronic ballast circuit including a resonant tank circuit having a power output operatively coupled to the source of UV radiation, the electronic ballast circuit operable to control the continuously variable intensity of the source of UV radiation over a continuous range of power levels by continuously measuring the current supplied to the source of UV radiation and adjusting a frequency of a drive voltage supplied to the resonant tank circuit responsive to at least one input signal based at least partially from a measured TOC value of the inlet water;
- Wherein the electronic ballast circuit controls the continuously variable intensity of the source of UV radiation to provide sufficient power to said source of UV radiation to remove a desired amount of TOC from fluid undergoing treatment while not producing more ultraviolet radiation than is necessary to remove the desired amount of TOC;
- Removing at least a portion of any particulates from the water to produce the ultrapure water;
- and
- Delivering at least a portion of the ultrapure water to the semiconductor fabrication unit.
Dependencies are inferred from the claim text.