Method for producing wiring substrate
AssigneeToyota Jidosha Kabushiki Kaisha
InventorsHaruki Kondoh, Rentaro Mori, Hiroshi Yanagimoto, Keiji Kuroda, Kazuaki Okamoto
Life of this patent
Estimating the term…
Loading patent…
AssigneeToyota Jidosha Kabushiki Kaisha
InventorsHaruki Kondoh, Rentaro Mori, Hiroshi Yanagimoto, Keiji Kuroda, Kazuaki Okamoto
Estimating the term…
The present disclosure provides a method for producing a wiring substrate. A seeded substrate is first prepared. The seeded substrate includes an insulation substrate, a conductive undercoat layer having a hydrophilic surface and provided on the insulation substrate, a conductive seed layer provided on a first region of the surface of the undercoat layer, the first region having a predetermined pattern, and a water-repellent layer on the second region of the surface of the undercoat layer, the second region being a region other than the first region. Subsequently, a metal layer is formed on the seed layer. A voltage is applied between the anode and the seed layer while a solid electrolyte membrane being disposed between the seeded substrate and the anode, and the solid electrolyte membrane and the seed layer being pressed into contact with each other. Thereafter, the water-repellent layer and the undercoat layer are etched.
A method for producing a wiring substrate comprising an insulation substrate and a wiring layer having a predetermined wiring pattern and provided on the insulation substrate, the method comprising steps of:
Dependencies are inferred from the claim text.