Transferring device of semiconductor manufacturing and method of cleaning transferring chamber of the transferring device

A transferring device, comprising:

• a transferring chamber configured to store a wafer;
• a vacuum system positioned below the transferring chamber and configured to extract particles in the transferring chamber, the vacuum system comprises:
• an extracting pipe communicated with the transferring chamber;
• and
• a thermoelectric device positioned on the extracting pipe,
• wherein the thermoelectric device comprises a cooling apparatus and a monitoring device;
• the cooling apparatus positioned under the transferring chamber configured to cool the transferring chamber, such that particles in the transferring chamber are cooled and fall to a lower part of the transferring chamber, the cooling apparatus comprises a plurality of Peltier elements arranged on the extracting pipe to cool the transferring chamber;
• the monitoring device is positioned on the cooling apparatus and communicated with the extracting pipe, the monitoring device configured to detect a concentration of the particles in the extracting pipe and send a cleaning alert if the concentration of the particles is greater than or equal to a predetermined threshold value.