Gasbox for semiconductor processing chamber
AssigneeApplied Materials, Inc.
InventorsRahul Rajeev, Yunzhe Yang, Abhijit A. Kangude, Kedar Joshi
Life of this patent
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Abstract
Exemplary semiconductor processing chambers may include a gasbox including a first plate having a first surface and a second surface opposite to the first surface. The first plate of the gasbox may define a central aperture that extends from the first surface to the second surface. The first plate may define an annular recess in the second surface. The first plate may define a plurality of apertures extending from the first surface to the annular recess in the second surface. The gasbox may include a second plate characterized by an annular shape. The second plate may be coupled with the first plate at the annular recess to define a first plenum within the first plate.
Claims20
A semiconductor processing chamber gasbox comprising:
- a first plate having a first surface and a second surface opposite to the first surface, wherein:
- the first plate defines a central aperture that extends from the first surface to the second surface, the first plate defines an annular recess in the second surface, the annular recess being defined by an inner wall and an outer wall, wherein each of the inner wall and the outer wall is coaxial with the central aperture, and the first plate defines a plurality of apertures extending from the first surface to the annular recess in the second surface;
- and a second plate characterized by an annular shape, wherein at least a portion of the second plate is seated within the annular recess to define a first plenum within the first plate, and wherein an outer edge of the second plate is positioned against the outer wall and, wherein an inner edge of the second plate is positioned against the inner wall.
A semiconductor processing chamber comprising:
- a manifold providing fluid access to the chamber for a plurality of fluids;
- a gasbox comprising:
- a first plate having a first surface and a second surface opposite to the first surface, wherein:
- the first plate defines a central aperture that extends from the first surface to the second surface, the first plate defines an annular recess in the second surface, the annular recess being defined by an inner wall and an outer wall, wherein each of the inner wall and the outer wall is coaxial with the central aperture, and the first plate defines a plurality of apertures extending from the first surface to the annular recess in the second surface;
- and a second plate characterized by an annular shape, wherein at least a portion of the second plate is seated within the annular recess to define a first plenum within the first plate, and wherein an outer edge of the second plate is positioned against the outer wall and, wherein an inner edge of the second plate is positioned against the inner wall.
Dependencies are inferred from the claim text.