Substrate processing apparatus, recording medium, and fluid circulation mechanism

A non-transitory computer-readable recording medium storing a program executed in a computer controlling a substrate processing apparatus comprising:

• a reaction furnace into which a substrate holder holding a plurality of substrates is loaded and unloaded from;
• a preparatory chamber provided below the reaction furnace, the substrate holder being disposed at a predetermined position in the preparatory chamber;
• an elevator configured to raise and lower the substrate holder between the reaction furnace and the preparatory chamber;
• a fluid circulator including a plurality of suction ports configured to suck a portion of a fluid within the preparatory chamber, a pipe constituting a flow path through which the fluid flows from the plurality of suction ports to a supply duct, and a plurality of coolers provided in the flow path and configured to cool the fluid;
• and
• a cooling plate that is:
• disposed on a first wall of the preparatory chamber,
• the first wall being closest to a position where the substrate holder is raised or lowered among side walls of the preparatory chamber,
• disposed not to face the supply duct,
• configured to be capable of cooling another portion of the fluid that is not aspirated by the plurality of suction ports, after the fluid has passed through the substrate holder from the supply duct, and
• configured to absorb radiant heat from the reaction furnace while the substrate holder is being raised or lowered,
• wherein the pipe includes a vertical duct disposed in the preparatory chamber and extending in a vertical direction of the substrate holder,
• wherein the plurality of suction ports are formed in the vertical duct and separately disposed in a middle portion and an upper portion of the vertical duct in the vertical direction of the substrate holder when the substrate holder is disposed at the predetermined position in the preparatory chamber, and
• wherein the program causes, by the computer, the substrate processing apparatus to perform:
• processing the substrates held by the substrate holder;
• lowering the substrate holder from the reaction furnace to the predetermined position in the preparatory chamber;
• sucking the fluid within the preparatory chamber from the plurality of suction ports into the flow path;
• and
• cooling the fluid with the plurality of coolers disposed in the vertical duct and close to the plurality of suction ports before the fluid introduced from the plurality of suction ports is circulated through the flow path, circulating the cooled fluid through the flow path, and discharging the fluid from the supply duct to the preparatory chamber.