Method and use for low-temperature epitaxy and film texturing between a two-dimensional crystalline layer and metal film

A method of making epitaxy and film texturing between a two-dimensional crystal layer and metal film, comprising the steps of:

• providing the metal film on a substrate;
• wherein the metal film comprises a thickness from 1 nm to 200 nm on the substrate;
• wherein the metal film comprises one selected from the group consisting of Au, Ag, Ni, Pd, Pt, Cu, W, Mo, and Cr;
• transferring or depositing the two-dimensional crystal layer onto the metal film and forming a two-dimensional crystal layer on metal film complex;
• wherein the two-dimensional crystal layer comprises a thickness from one monolayer to 100 layers;
• wherein the two-dimensional crystal layer comprises one selected from the group consisting of graphene, transition metal dichalcogenides, and hexagonal boron nitride;
• heating the two-dimensional crystal layer on metal film complex;
• and
• forming a first epitaxy and film texturing between the two-dimensional crystal layer and metal film;
• wherein the first epitaxy and film texturing between the two-dimensional crystal layer and metal film comprises a textured porous metallic film;
• wherein the textured porous metal film crystallographically orients with the two-dimensional crystal layer;
• and
• wherein the two-dimensional crystal layer is suspended over and/or
• wherein the two-dimensional crystal layer is within the pores
• of the textured porous metallic film.