Film forming apparatus and film forming method

A film forming apparatus for forming an organic film of a polymer on a substrate by deposition polymerization, the film forming apparatus comprising:

• a processing chamber in which the substrate is accommodated;
• a gas supply configured to supply a gas containing a first monomer and a gas containing a second monomer into the processing chamber;
• and
• a concentration distribution controller configured to control a gas flow within the processing chamber such that a concentration of a mixed gas including the gas containing the first monomer and the gas containing the second monomer on the substrate has a predetermined distribution,
• wherein the substrate includes a first region and a second region, and the film forming apparatus is configured such that the concentration of the mixed gas in a region corresponding to the first region is higher than the concentration of the mixed gas in a region corresponding to the second region,
• wherein the film forming apparatus further comprises a temperature distribution controller configured to control a temperature distribution of the substrate such that a temperature of the first region is higher than a temperature of the second region,
• wherein the concentration distribution controller includes:
• a plurality of first supply ports arranged along a peripheral edge of the substrate and configured to supply the gas containing the first monomer and the gas containing the second monomer to outside of a region of the substrate within the processing chamber;
• and
• a lifter configured to control a distance between the substrate placed on a stage provided in the processing chamber and a ceiling plate of the processing chamber, and
• wherein the concentration distribution controller is configured to control a conductance between the ceiling plate and the substrate on the stage with respect to a conductance of a space outside of the region of the substrate by using the lifter to control a flow of the mixed gas within the processing chamber such that the concentration of the mixed gas on the substrate has the predetermined distribution.