Substrate processing apparatus and substrate processing method
AssigneeCanon Anelva Corporation
InventorsYuji Takanami, Kento Norota, Naoyuki Okamoto, Yasuo Kato, Yasushi Yasumatsu
Life of this patent
Estimating the term…
Abstract
A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.
Claims13
A substrate processing method of processing a substrate, comprising:
- a processing step of processing the substrate using particles emitted from a particle source while conveying the substrate in a predetermined conveyance direction along a conveyance surface and controlling a posture and a position of the particle source that emits particles,
- wherein a target processing portion of the substrate, which is a portion to be processed using the particles, changes as the substrate is conveyed, and
- the processing step includes a driving step of, in accordance with a change of the target processing portion of the substrate, making the particle source pivot about a rotation axis orthogonal to the conveyance direction and moving the particle source such that a distance between the particle source and the conveyance surface is changed;
- wherein
- the particle source is a target held by a cathode, and
- a film is formed on the substrate using particles emitted by sputtering of the cathode.
A substrate processing method of processing a substrate, comprising:
- a processing step of processing the substrate using particles emitted from a particle source while conveying the substrate in a predetermined conveyance direction along a conveyance surface and controlling a posture and a position of the particle source that emits particles,
- wherein a target processing portion of the substrate, which is a portion to be processed using the particles, changes as the substrate is conveyed, and
- the processing step includes a driving step of, in accordance with a change of the target processing portion of the substrate, making the particle source pivot about a rotation axis orthogonal to the conveyance direction and moving the particle source such that a distance between the particle source and the conveyance surface is changed;
- wherein the particle source is an ion beam source.
A substrate processing method of processing a substrate, comprising:
- a processing step of processing the substrate using particles emitted from a particle source while conveying the substrate in a predetermined conveyance direction along a conveyance surface and controlling a posture and a position of the particle source that emits particles,
- wherein a target processing portion of the substrate, which is a portion to be processed using the particles, changes as the substrate is conveyed, and
- the processing step includes a driving step of, in accordance with a change of the target processing portion of the substrate, making the particle source pivot about a rotation axis orthogonal to the conveyance direction and moving the particle source such that a distance between the particle source and the conveyance surface is changed;
- wherein in the driving step, by making the particle source pivot along a revolution orbit around a revolution axis parallel to the rotation axis, the particle source is moved such that the distance between the particle source and the conveyance surface is changed.
Dependencies are inferred from the claim text.