Stage and plasma processing apparatus

A stage for a plasma processing apparatus, comprising:

• a power feeder that provides a transmission path configured to transmit high-frequency waves from a high-frequency power source;
• and
• an electrostatic chuck including a conductive base provided above the power feeder, and electrically connected to the power feeder, and a chuck main body provided on the base and configured to hold a substrate with electrostatic attractive force,
• wherein the chuck main body has:
• a plurality of first heaters provided in the chuck main body to be distributed on a plane in the chuck main body which is orthogonal to a central axis of the chuck main body, and
• a plurality of second heaters provided in the chuck main body to be distributed on a separate plane in the chuck main body which is orthogonal to a central axis of the chuck main body, the number of second heaters being larger than the number of first heaters, and
• wherein the stage further includes:
• a first heater controller configured to drive the plurality of first heaters by an alternating current output or a direct current output from a first power source, and
• a second heater controller configured to drive the plurality of second heaters by an alternating current output or a direct current output from a second power source;
• the stage further includes a plurality of first power feeding lines electrically connected to the plurality of first heaters, respectively;
• and
• a plurality of second power feeding lines electrically connected to the plurality of second heaters, respectively,
• wherein the first heater controller is configured to produce a plurality of first outputs by distributing the output from the first power source and to supply the plurality of first outputs, which have individually adjusted power amounts, to the plurality of first heaters through the plurality of first power feeding lines, respectively,
• wherein the second heater controller is configured to produce a plurality of second outputs by distributing the output of the second power source and to supply the plurality of second outputs, which have individually adjusted power amounts, to the plurality of second heaters through the plurality of second power feeding lines, respectively,
• wherein the power feeder defines an accommodation space surrounded by the transmission path, and
• wherein the plurality of first power feeding lines, the first heater controller, the plurality of second power feeding lines, and the second heater controller are disposed in the accommodation space.