Silicon nitride x-ray window and method of manufacture for x-ray detector use
AssigneeBruker Nano, Inc.
InventorsJoseph S. Fragala, Xing Zhao
Life of this patent
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Abstract
A method for producing a radiation window includes patterning a photo resist structure onto a double-sided silicon wafer, plasma etching the silicon wafer to create an etched silicon wafer having a silicon supporting structure etched upon a first side of the double-sided silicon wafer, applying a silicon nitride thin film to the etched silicon wafer, patterning a photo resist structure and plasma etching a second side of the double-sided silicon wafer to create an initial window in the silicon nitride thin film, and wet etching the second side of the double-sided silicon wafer to release the silicon nitride thin film and supporting structure from the portion of the double-sided silicon wafer defined by the initial window.
Claims20
A method for producing a radiation window, comprising:
- patterning a photo resist structure onto a substrate,
- plasma etching the substrate to create an etched substrate having a supporting structure etched upon a first side of the substrate,
- applying a thin film to the etched substrate,
- patterning a photo resist structure and etching a second side of the substrate to create a silicon exposure area in the thin film;
- and
- etching the second side of the substrate to release the thin film and the supporting structure from the portion of the substrate defined by the silicon exposure area.
A radiation window assembly in an emissive x-ray detector, comprising:
- a double-sided silicon wafer frame applied with a thin film including,
- a first side including a radiation window, and
- a second side including a radiation window opening where the thin film and underlying double-sided silicon wafer were etched to create a silicon exposure area where the radiation window opening defines the radiation window within the double-sided silicon wafer frame;
- and
- a supporting structure on the first side of the double-sided silicon wafer frame, wherein the thin film is applied to the supporting structure.
Dependencies are inferred from the claim text.