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US 11,694,835 B2Granted
Inductor device
AssigneeRealtek Semiconductor Corp.
InventorsHsiao-Tsung Yen, Ka-Un Chan
Life of this patent
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Abstract
An inductor device includes a first trace, a second trace, and a double ring inductor. The first trace is disposed at a first area. The second trace is disposed at a second area. The double ring inductor is located at an outside of the first trace and the second trace. The double ring inductor is respectively coupled to the first trace and the second trace in an interlaced manner.
Claims20
An inductor device, comprising:
- a first trace disposed in a first area;
- a second trace disposed in a second area;
- a double ring inductor disposed at an outside of the first trace and the second trace, wherein the double ring inductor is respectively coupled to the first trace and the second trace in an interlaced manner;
- and
- a first connector coupled to traces of the double ring inductor at an outer side of the double ring inductor, wherein an entirety of the double ring inductor and the first connector are disposed on different layers.
2 more elements
Dependencies are inferred from the claim text.