3D microgeometry and reflectance modeling
AssigneesSony Group Corporation, Sony Corporation of America
InventorsChen Fu, Mohammad Gharavi-Alkhansari
Life of this patent
Estimating the term…
Loading patent…
AssigneesSony Group Corporation, Sony Corporation of America
InventorsChen Fu, Mohammad Gharavi-Alkhansari
Estimating the term…
A system and method for three-dimensional (3D) microgeometry and reflectance modeling is provided. The system receives images comprising a first set of images of a face and a second set of images of the face. The faces in the first set of images and the second set of images are exposed to omni-directional lighting and directional lighting, respectively. The system generates a 3D face mesh based on the received images and executes a set of skin-reflectance modeling operations by using the generated 3D face mesh and the second set of images, to estimate a set of texture maps for the face. Based on the estimated set of texture maps, the system texturizes the generated 3D face mesh. The texturization includes an operation in which texture information, including microgeometry skin details and skin reflectance details, of the estimated set of texture maps is mapped onto the generated 3D face mesh.
A system, comprising:
A method, comprising:
A non-transitory computer-readable medium having stored thereon, computer-executable instructions that when executed by a system, causes the system to execute operations, the operations comprising:
Dependencies are inferred from the claim text.