Measurement apparatus, lithography apparatus and article manufacturing method

A measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus comprising:

• an image capturing unit including a plurality of pixels which detect light from the first pattern and light from the second pattern, and configured to form an image capturing region used to capture the first pattern and the second pattern by the plurality of pixels;
• and
• a control unit configured to control the image capturing unit to obtain the position of the first pattern and the position of the second pattern based on an output from the image capturing unit,
• wherein the control unit
• sets, based on the position of the first pattern and the position of the second pattern, a first image capturing region used to capture the first pattern and a second image capturing region used to capture the second pattern in the image capturing region, and
• adjusts the image capturing unit such that a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from the first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from the second image capturing region falls within an allowable range.