Treatment liquid for manufacturing semiconductor, storage container storing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device
AssigneeFUJIFILM Corporation
InventorsTetsuya Shimizu, Tetsuya Kamimura
Life of this patent
Estimating the term…
Abstract
A storage container storing a treatment liquid for manufacturing a semiconductor is provided, wherein the occurrence of defects on the semiconductor, such as particles, is suppressed and a fine resist pattern or a fine semiconductor element is manufactured. The storage container includes a storage portion that stores a treatment liquid for manufacturing a semiconductor, and the treatment liquid for manufacturing a semiconductor includes one kind or two or more kinds of metal atoms and a total content of particulate metal is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid.
Claims14
A storage container comprising:
- a storage portion that stores a treatment liquid for manufacturing a semiconductor,
- wherein a mass ratio of Cr/Fe in a portion having a depth of 1 nm from an outermost surface of an inner wall of the storage portion that comes into contact with the treatment liquid is 1 to 3,
- wherein the treatment liquid includes one kind or two or more kinds of metal atoms selected from the group consisting of Cu, Fe, and Zn, and
- a total content of particulate metal including at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid,
- wherein a material of at least a portion of the inner wall of the storage portion that comes into contact with the treatment liquid includes perfluoroalkoxy alkane.
A storage container comprising:
- a storage portion that stores a treatment liquid for manufacturing a semiconductor,
- wherein a mass ratio of Cr/Fe in a portion having a depth of 1 nm from an outermost surface of an inner wall of the storage portion that comes into contact with the treatment liquid is 1 to 3,
- wherein the treatment liquid includes one kind or two or more kinds of metal atoms selected from the group consisting of Cu, Fe, and Zn, and
- a total content of particulate metal including at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid,
- wherein a material of at least a portion of the inner wall of the storage portion that comes into contact with the treatment liquid includes at least one selected from the group consisting of polyethylene, polypropylene, polytetrafluoroethylene, and perfluoroalkoxy alkane.
Dependencies are inferred from the claim text.