Resist composition and method of forming resist pattern

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:

• a resin component (A1) which exhibits changed solubility in a developing solution under action of acid,
• an acid generator component (B) which generates acid upon exposure, and
• a compound (DO) represented by general formula (d0) shown below having a cation moiety and an anion moiety,
• the resin component (A1) comprising a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-11-1) shown below:
• wherein Mm+ represents an m-valent organic cation;
• m represents an integer of 1 or more, Rd0 represents a substituent;
• p represents an integer of 0 to 3;
• when p is 2 or 3, the plurality of Rd0 may be the same or different from each other;
• q represents an integer of 0 to 3;
• n represents an integer of 2 or more;
• provided that n+p (q×2)+5;
• wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms;
• Va01 represents a divalent hydrocarbon group optionally having an ether bond;
• na01 represents an integer of 0 to 2;
• Rax01 is a group represented by general formula (a0-r-1) shown below, a general formula (a0-r-2) shown below or a group represented by general formula (a0-r-3) shown below:
• wherein, in formula (a0-r-1), Ct represents a tertiary carbon atom;
• Ra′110 represents a linear or branched alkyl group having 1 to 12 carbon atoms optionally having part thereof substituted with a halogen atom or a hetero atom-containing group;
• Ra′111 is a group which forms a monocyclic alicyclic hydrocarbon group together with Ct;
• provided that part or all of the hydrogen atoms of the monocyclic alicyclic hydrocarbon group may be substituted;
• provided that, in the monocyclic alicyclic hydrocarbon group, the α-position of Ct is a carbon atom constituting a carbon-carbon unsaturated bond;
• in formula (a0-r-2), Ct represents a tertiary carbon atom;
• Xa is a group which forms a monocyclic alicyclic hydrocarbon group together with Ct;
• provided that part or all of the hydrogen atoms of the monocyclic alicyclic hydrocarbon group may be substituted;
• Ra01 to Ra03 each independently represents a hydrogen atom, a monovalent saturated chain hydrocarbon group of 1 to 10 carbon atoms or a monovalent saturated aliphatic cyclic hydrocarbon group of 3 to 20 carbon atoms;
• provided that part or all of the hydrogen atoms of the saturated chain hydrocarbon or the saturated aliphatic cyclic hydrocarbon may be substituted with a substituent;
• 2 or more of Ra01 to Ra03 may be mutually bonded to form an aliphatic cyclic structure, but does not form a bridged structure;
• in formula (a0-r-3), Ct represents a tertiary carbon atoms;
• Xaa is a group which forms a cyclopentane ring together with Ct;
• provided that part or all of the hydrogen atoms of the monocyclic alicyclic hydrocarbon group may be substituted with a substituent;
• Ra04 represents an aromatic hydrocarbon group which may have a substituent;
• and * represents a bonding site.