Auto-focusing device and method of fabricating the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTing-Jung Chen, Shih-Wei Lin
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Abstract
In accordance with some embodiments, a method of forming an auto-focusing device is provided. The method includes forming a cantilever beam member. The cantilever beam member has a ring shape. The method further includes forming a piezoelectric member over the cantilever beam member. The method also includes forming a membrane over the cantilever beam member. The membrane has a first region and a second region. The first region has a planar surface, and the second region is located between the first region and an inner edge of the cantilever beam member and has a plurality of corrugation structures. In addition, the method includes applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer.
Claims20
A method, comprising:
- forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
- forming a dielectric layer on the supporting layer;
- forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
- patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
- covering the dielectric layer with a membrane, wherein the membrane is conformally formed over the first projection and the second projection;
- applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer;
- and
- etching the base layer, the supporting layer and the patterned dielectric layer to expose the membrane.
A method, comprising:
- forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
- forming a dielectric layer over the supporting layer;
- forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
- patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
- covering the patterned dielectric layer with a membrane, wherein a first portion of the membrane on a center of the central region of the supporting layer has a top surface lower than a top surface of a second portion of the membrane on the first projection;
- applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer;
- and
- etching the base layer, the supporting layer, the first projection, and the second projection to expose the membrane.
A method, comprising:
- forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
- forming a dielectric layer on the supporting layer;
- forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
- patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
- forming a membrane to cover the piezoelectric member, the first projection and the second projection, wherein a first portion of the membrane between the first projection and the second projection has a top surface lower than a top surface of a second portion of the membrane on the first projection;
- applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer;
- and
- etching the base layer, the supporting layer, the first projection, and the second projection to expose the membrane.
Dependencies are inferred from the claim text.