Optical waveguide device and method of manufacturing optical waveguide device
AssigneeFujitsu Optical Components Limited
InventorsShuntaro Makino, Yoshinobu Kubota, Yasuhiro Ohmori, Masaharu Doi, Shintaro Takeuchi
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Abstract
An optical waveguide device has a substrate, an intermediate layer, a thin-film LN layer containing an X-cut lithium niobate, and a buffer layer stacked on the substrate, and an optical waveguide having a ridge shape formed in the thin-film LN layer. The optical waveguide device includes a plurality of electrodes provided, respectively, at a first side and a second side of the optical waveguide. The electrodes are disposed so that respective bottom surfaces thereof are at positions lower than a position of a surface of the buffer layer.
Claims1
An optical waveguide device, comprising:
- a substrate;
- a buffer layer stacked on the substrate and containing SiO2;
- an optical waveguide of a rectangular core type containing an X-cut lithium niobate, the optical waveguide having a top, bottom, right and left surfaces all of which are in contact with the SiO2 of the buffer layer;
- and
- a plurality of electrodes provided, respectively, at a first side and a second side of the optical waveguide, wherein
- the electrodes are disposed so that respective bottom surfaces thereof are at positions lower than a position of a surface of the buffer layer.
Dependencies are inferred from the claim text.