Back to results
US 11,693,165 B2Granted
Thin film optics
AssigneeLockheed Martin Corporation
InventorJoseph Robert Buck
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a thin film optical apparatus includes providing a substrate and applying an alignment layer over the substrate. The alignment layer ranges from about 50 to 100 nm in thickness. The method includes imprinting a hologram with a desired optic pattern onto the alignment layer and applying at least one layer of mesogen material over the alignment layer.
Claims12
A method of manufacturing a thin film optical apparatus, the method comprising:
- providing a substrate;
- applying an alignment layer over the substrate, wherein the alignment layer ranges from about 50 to 100 nm in thickness;
- imprinting a hologram with an optic pattern onto the alignment layer by:
- imparting a geometric phase utilizing a polarization based holographic interferometer to convert a binary amplitude hologram to a phase hologram, and
- mixing the phase hologram with an oscillator;
- applying at least one layer of mesogen material over the alignment layer;
- and
- positioning a layer of reflective material between the alignment layer and the substrate.
5 more elements
Dependencies are inferred from the claim text.