Inspection apparatus and inspection method

A method of inspection for detecting defects on a substrate for a reflective reticle, wherein the substrate is configured to be illuminated by radiation having an actinic wavelength to expose an object with a pattern of the reticle, the method comprising:

• performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range, the first inspection radiation obtained from a high harmonic generation source, the one or more first wavelengths being within a wavelength range of between 20 nm and 150 nm, and the one or more first wavelengths being approximately an integer multiple, other than 1, of the actinic wavelength;
• and
• performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the one or more wavelengths of the first inspection radiation.