Optical nanostructure rejecter for an integrated device and related methods

A method of operating an integrated device, the method comprising:

• coupling, from a waveguide formed on a substrate, excitation radiation to a reaction chamber formed adjacent to the waveguide, the excitation radiation having a first wavelength;
• passing emission radiation from the reaction chamber through an optical nanostructure to a sensor, wherein the emission radiation has a second wavelength different than the first wavelength and is generated in response to excitation of at least one emitter in the reaction chamber by the excitation radiation;
• and
• rejecting at least a portion of the excitation radiation with the optical nanostructure.

A method for fabricating an integrated device, the method comprising:

• forming, on a substrate having a first surface, a plurality of pixels such that at least some of the plurality of pixels comprises a reaction chamber and a sensor;
• forming a waveguide in the at least some of the plurality of pixels;
• and
• forming an optical nanostructure in the at least some of the plurality of pixels between the waveguide and the sensor, wherein forming the optical nanostructure comprises:
• patterning a first dielectric material to include structural variations in a plane substantially parallel to the first surface of the substrate.