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US 11,692,269 B2Granted
Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsHiroyuki Matsuura, Kiyotaka Ishibashi
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Abstract
A plasma processing apparatus includes: a processing container having a cylindrical shape; a pair of plasma electrodes arranged along the longitudinal direction of the processing container while facing each other; and a radio-frequency power supply configured to supply a radio-frequency power to the pair of plasma electrodes. In the pair of plasma electrodes, an inter-electrode distance at a position distant from a power feed position to which the radio-frequency power is supplied is longer than an inter-electrode distance at the power feed position.
Claims9
A plasma processing apparatus comprising:
- a processing container having a cylindrical shape;
- a plasma partition wall configured to cover an opening formed along a longitudinal direction of the processing container;
- a pair of plasma electrodes arranged on outer surfaces of both side walls of the plasma partition wall along the longitudinal direction of the processing container while facing each other;
- a radio-frequency power supply configured to supply a radio-frequency power to the pair of plasma electrodes;
- and
- a pair of power feed lines configured to connect the pair of plasma electrodes to the radio-frequency power supply, respectively,
- wherein an inter-electrode distance at a position distant from a power feed position where the pair of plasma electrodes are connected to the pair of power feed lines, respectively, is longer than an inter-electrode distance at the power feed position when viewed from a front of the plasma partition wall.
4 more elements
Dependencies are inferred from the claim text.