Evaporator chamber for forming films on substrates

A system for processing a substrate, the system comprising:

• a process chamber comprising:
• a chamber body,
• a lid plate having a plurality of cooling channels formed therein,
• a rotatable pedestal, the rotatable pedestal having a plurality of cooling channels formed therein, and
• a showerhead disposed above the rotatable pedestal, the showerhead comprising a plurality of segments, each of the plurality of segments comprising an edge wall having a perimeter, and
• a plurality of shield structures, each of the plurality of shield structures made of a thermally conductive material that includes aluminum or stainless steel, and each of the plurality of shield structures comprising:
• a top wall above a respective segment of the plurality of segments, and
• a side wall coupled to the top wall, the side wall surrounding a respective perimeter of the respective edge wall of a respective segment of the plurality of segments, wherein the side wall is disposed at least partially between the respective segment and adjacent segments of the plurality of segments;
• a plurality of ampoules, each ampoule of the plurality of ampoules configured to deliver a material;
• a plurality of ampoule heating elements, each ampoule heating element of the plurality of ampoule heating elements configured to heat a respective ampoule of the plurality of ampoules,
• a plurality of fluid delivery lines coupled to the showerhead;
• and
• one or more vacuum pumps coupled to the chamber body and each of the plurality of fluid delivery lines, wherein
• each respective fluid delivery line of the fluid delivery lines comprises:
• a dedicated shut-off valve configured to flow the material to the showerhead, the dedicated shut-off valve operable in an open position and a closed position, and the dedicated shut-off valve positioned between:
• the showerhead on a first side of the dedicated shut-off valve, and
• the respective ampoule and a respective ampoule heating element of the plurality of ampoule heating elements on a second side of the dedicated shut-off valve,
• a dedicated by-pass valve positioned between the dedicated shut-off valve and the one or more vacuum pumps, the dedicated by-pass valve operable in a by-pass open position and a by-pass closed position, wherein:
• the dedicated by-pass valve of each of the fluid delivery lines is positioned between the showerhead and the one or more vacuum pumps and between the one or more vacuum pumps and a downstream side of the dedicated shut-off valve of the respective fluid delivery line, and
• at least one vacuum pump of the one or more vacuum pumps is configured to remove at least a portion of the material from at least a portion of the showerhead and at least a portion of the respective fluid delivery line disposed between the showerhead and the downstream side of the dedicated shut-off valve of the respective fluid delivery line when the dedicated shut-off valve is in the closed position and the dedicated by-pass valve is in the by-pass open position.