Apparatus for materials processing
AssigneeAvava, Inc.
InventorsJoseph Ting, Charles Holland Dresser, Jayant Bhawalkar
Life of this patent
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Abstract
A method includes depositing a plurality of dopant particles within a predetermined region of a transparent material. The method also includes focusing a laser beam along an optical axis to a focal region that overlaps with at least a portion of the predetermined region. The focal region can irradiate at least a first dopant particle of the plurality of dopant particles. The method further includes adjusting a parameter of the laser beam to generate a plasma configured to form an inclusion within the transparent material. The method additionally includes scanning the focal region along a path within the transparent material to elongate the inclusion generally along the path.
Claims23
A method comprising:
- depositing a plurality of dopant particles within a predetermined region of a transparent material;
- focusing a laser beam along an optical axis to a focal region that overlaps with at least a portion of the predetermined region, wherein the focal region irradiates at least a first dopant particle of the plurality of dopant particles for a pulse duration within a range of 0.1 nanoseconds to 100 nanoseconds, which is sufficient to allow heat diffusion while selectively generating thermionic plasma within the predetermined region;
- adjusting a parameter of the laser beam to generate a plasma configured to form an inclusion within the transparent material;
- and,
- scanning the focal region along a path within the transparent material to elongate the inclusion generally along the path;
- wherein the inclusion comprises a sub-surface microfluidic channel.
A system comprising:
- a focus optic configured to focus a laser beam along an optical axis to a focal region that overlaps with at least a portion of a predetermined region of a transparent material that is deposited with a plurality of dopant particles, wherein the focal region irradiates at least a first dopant particle of the plurality of dopant particles for a pulse duration within a range of 0.1 nanoseconds to 100 nanoseconds, which is sufficient to allow heat diffusion while selectively generating thermionic plasma within the predetermined region;
- a controller configured to adjust at least one of a power, a pulse energy, a repetition rate, a pulse duration, and a wavelength of the laser beam to generate plasma in order to form an inclusion within the transparent material, wherein the inclusion comprises a sub-surface microfluidic channel;
- and,
- a scanner configured to scan the focal region along a path within the transparent material to elongate the inclusion generally along the path.
Dependencies are inferred from the claim text.