Method and apparatus for creating and sintering fine lines and patterns
AssigneeNederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
InventorsGari Arutinov, Edsger Constant Pieter Smits, Jeroen Van Den Brand
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Abstract
The invention aims to provide a contactless method to create small conductive tracks on a substrate. To this end a method is provided for selective material deposition, comprising depositing a first material on a substrate; followed by solidifying the first material selectively in a first solidified pattern by one or more energy beams; and followed by propelling non-solidified material away from the substrate by a large area photonic exposure, controlled in timing, energy and intensity to leave the solidified first pattern of the first material.
Claims15
A method for selective material deposition, the method comprising:
- depositing a layer of a first material on a substrate;
- followed by
- selectively solidifying portions of the layer of the first material in a first solidified pattern by one or more energy beams;
- selectively solidifying a further portion of the layer of the first material in a secondary solidified pattern by the one or more energy beams;
- and
- entirely exposing, after the selectively solidifying the portion and the selectively solidifying the further portion, the layer of the first material to a photonic exposure that is controlled in timing, energy and intensity so as to leave on the substrate only the portion of the layer of the first material in the first solidified pattern by:
- selectively propelling a non-solidified material portion of the layer of the first material away from the substrate;
- and
- further propelling, solidified material corresponding to the further portion of the layer of the first material in the secondary solidified pattern away from the substrate;
- wherein the secondary solidified pattern is:
- complementary to the first solidified pattern, and
- constructed to break up the non-solidified material portion during the entirely exposing.
A method for selective material deposition, the method comprising:
- depositing a layer of a first material on a substrate;
- selectively sintering, after the depositing the layer, portions of the layer of the first material in a first solidified pattern by one or more energy beams;
- and
- selectively propelling, after the selectively sintering portions of the layer of the first material in the first solidified pattern, non-solidified material away from the substrate by a photonic exposure exposing the entire deposited layer of the first material on the substrate, controlled in timing, energy and intensity to leave on the substrate the first solidified pattern of the first material.
Dependencies are inferred from the claim text.