HEMT and method of fabricating the same
AssigneeUnited Microelectronics Corp.
InventorsChih-Wei Chang, Yao-Hsien Chung, Shih-Wei Su, Hao-Hsuan Chang, Da-Jun Lin, Ting-An Chien, Bin-Siang Tsai
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AssigneeUnited Microelectronics Corp.
InventorsChih-Wei Chang, Yao-Hsien Chung, Shih-Wei Su, Hao-Hsuan Chang, Da-Jun Lin, Ting-An Chien, Bin-Siang Tsai
Estimating the term…
An HEMT includes a first III-V compound layer. A second III-V compound layer is disposed on the first III-V compound layer. The composition of the first III-V compound layer is different from the composition of the second III-V compound layer. A trench is disposed within the first III-V compound layer and the second III-V compound layer. The trench has a first corner and a second corner. The first corner and the second corner are disposed in the first III-V compound layer. A first dielectric layer contacts a sidewall of the first corner. A second dielectric layer contacts a sidewall of the second corner. The first dielectric layer and the second dielectric layer are outside of the trench. A gate is disposed in the trench. A source electrode and a drain electrode are respectively disposed at two sides of the gate. A gate electrode is disposed directly on the gate.
A high electron mobility transistor (HEMT) comprising:
Dependencies are inferred from the claim text.