Batch processing oven and operating methods

A method of operating a batch processing oven having a processing chamber wherein (i) the processing chamber includes an inlet dissipater and an exhaust dissipater positioned on diametrically opposite sides of the processing chamber such that a rack is configured to be positioned between the inlet and exhaust dissipaters and one or more flow baffles positioned on an internal wall of the processing chamber, the one or more flow baffles being configured to restrict a flow of a gas around the rack positioned in the processing chamber, (ii) wherein the inlet dissipater includes multiple inlet tubes extending in a lengthwise direction along an internal wall of the processing chamber, and (iii) wherein the multiple inlet tubes are arranged circumferentially to form a partial arc around the internal wall and each inlet tube of the multiple inlet tubes includes a plurality of inlet ports spaced apart from each other in the lengthwise direction, the method comprising:

• positioning the rack in the processing chamber, wherein the rack supports a plurality of substrates and a plurality of panels in a stacked manner such that (a) one or more substrates of the plurality of substrates are positioned between at least one pair of adjacent panels of the plurality panels, and (b) vertical gaps separate each substrate of the plurality of substrates from an adjacent substrate or panel on either side of the substrate;
• and
• directing a flow of a hot gas into the processing chamber through the plurality of inlet ports of the inlet dissipater to heat the plurality of substrates;
• and
• restricting flow of the gas around the rack using the one or more flow baffles.

A batch processing oven, comprising:

• a substantially cylindrical processing chamber;
• an inlet dissipater including multiple inlet tubes extending in a lengthwise direction along an internal wall of the processing chamber, the multiple inlet tubes being arranged circumferentially to form a partial arc around the internal wall, each inlet tube of the multiple inlet tubes including a plurality of inlet ports spaced apart from each other in the lengthwise direction, the plurality of inlet ports being configured to direct a gas into the processing chamber;
• an exhaust dissipater positioned diametrically opposite the inlet dissipater, the exhaust dissipater being configured to exhaust the gas from the processing chamber;
• a rack configured to be positioned in the processing chamber, wherein the rack is configured to support a plurality of substrates and a plurality of panels in a stacked manner such that (a) one or more substrates of the plurality of substrates are positioned between at least one pair of adjacent panels of the plurality panels, and (b) vertical gaps separate each substrate of the one or more substrates from an adjacent substrate or panel on either side of the substrate;
• and
• one or more flow baffles positioned on an internal wall of the processing chamber, the one or more flow baffles being configured to restrict a flow of the gas around the rack positioned in the processing chamber.