Obtaining a clean nitride surface by annealing
AssigneeInternational Business Machines Corporation
InventorAakash Pushp
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Abstract
A method of forming a composite crystalline nitride structure is provided. The method includes depositing a first crystalline nitride layer on a substrate, patterning the first crystalline nitride layer to form a patterned crystalline nitride layer having a top surface and that includes undulations, annealing the patterned crystalline nitride layer at a temperature between 300° C. to 850° C. to form an annealed patterned crystalline nitride layer, and depositing a second crystalline nitride layer on the annealed patterned crystalline nitride layer. The second crystalline nitride layer is lattice-matched to the underlying annealed patterned crystalline nitride layer to within 2%, thereby forming the composite crystalline nitride structure.
Claims20
A method, comprising:
- depositing a first crystalline nitride layer on a planar substrate;
- patterning the first crystalline nitride layer to expose portions of the substrate and form a patterned crystalline nitride layer including undulations;
- annealing the patterned crystalline nitride layer at a temperature between 300° C. to 850° C. to form an annealed patterned crystalline nitride layer;
- and
- depositing a second crystalline nitride layer directly on the annealed patterned crystalline nitride layer and the substrate, thereby forming a composite crystalline nitride structure.
A method, comprising:
- depositing a first crystalline nitride layer on a planar substrate in a deposition chamber;
- breaking vacuum thereby exposing a top surface of the first crystalline nitride layer to ambient conditions;
- patterning the first crystalline nitride layer to expose portions of the substrate and form a patterned crystalline nitride layer including undulations;
- placing the patterned crystalline nitride layer into the deposition chamber;
- annealing the crystalline nitride layer at a temperature between 300° C. to 850° C. to form an annealed crystalline nitride layer;
- and
- depositing a second crystalline nitride layer directly on the annealed crystalline nitride layer and the substrate, thereby forming a composite crystalline nitride structure.
Dependencies are inferred from the claim text.