Plasma processing apparatus and plasma processing method

A plasma processing method, using a plasma processing apparatus including:

• a processing container extended in a longitudinal direction,
• a raw material gas supply configured to supply a raw material gas into the processing container,
• a plasma partition wall provided along the longitudinal direction of the processing container, defining a plasma generation space therein, and having an opening through which the plasma generation space and an inside of the processing container communicate with each other,
• a reaction gas supply configured to supply a reaction gas that reacts with the raw material gas, into the plasma generation space,
• an opening/closing plate provided between the plasma generation space and the inside of the processing container along the longitudinal direction of the processing container and configured to open/close the opening, and
• an inclination suppressing plate that suppresses the opening/closing plate from inclining toward a center of the processing container,
• the method comprising:
• supplying the reaction gas from the reaction gas supply into the plasma generation space in a state where the opening is opened by the opening/closing plate;
• and
• supplying the raw material gas from the raw material gas supply into the processing container in a state where the opening is closed by the opening/closing plate.

A plasma processing method, using a plasma processing apparatus including:

• a processing container extended in a longitudinal direction,
• a raw material gas supply configured to supply a raw material gas into the processing container,
• a plasma partition wall provided along the longitudinal direction of the processing container, defining a plasma generation space therein, and having an opening through which the plasma generation space and an inside of the processing container communicate with each other,
• a reaction gas supply configured to supply a reaction gas that reacts with the raw material gas, into the plasma generation space,
• an opening/closing plate provided between the plasma generation space and the inside of the processing container along the longitudinal direction of the processing container and configured to open/close the opening,
• an inclination suppressing plate that suppresses the opening/closing plate from inclining toward a center of the processing container,
• a second plasma partition wall provided along the longitudinal direction of the processing container to be separate from the plasma partition wall, defining a second plasma generation space therein, and having a second opening through which the second plasma generation space and the inside of the processing container communicate with each other, and
• a second reaction gas supply configured to supply the reaction gas into the second plasma generation space,
• the method comprising:
• performing a first film forming process that includes supplying the raw material gas from the raw material gas supply into the processing container and supplying the reaction gas from the second reaction gas supply into the second plasma generation space, in a state where the opening is closed by the opening/closing plate;
• and
• performing a second film forming process that includes supplying the reaction gas from the reaction gas supply into the plasma generation space in a state where the opening is opened by the opening/closing plate.