Automatic window generation for process trace
AssigneePDF Solutions, Inc.
InventorsRichard Burch, Kazuki Kunitoshi, Michio Aruga, Nobichika Akiya
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Abstract
Automatic definition of windows for trace analysis. For each process step, the trace data are aligned to both the start of the process step and the end of the process step, and statistics including rate of change are calculated from both the start of the process step and the end of the process step. Windows are generated based on analysis of the calculated statistics.
Claims17
A method for automatic window definition for analysis of semiconductor equipment trace data, comprising:
- receiving a plurality of sensor traces from a plurality of equipment sensors during a plurality of process steps of a semiconductor process;
- for each respective step of the plurality of process steps:
- aligning each sensor trace to a start of the respective step;
- calculating a first rate of change for each sensor trace aligned to the start of the respective step;
- aligning each sensor trace to an end of the respective step;
- and
- calculating a second rate of change for each sensor trace aligned to the end of the respective step;
- and
- defining a plurality of windows for bounding and analyzing the sensor traces in each window based primarily on the first and second rates of change calculated for each of the plurality of sensor traces.
A method for automatic window definition in the analysis of semiconductor equipment trace data, comprising:
- receiving trace data obtained from a plurality of semiconductor equipment sensors, the trace data associated with a plurality of process steps in a semiconductor process;
- aligning the trace data for each process step, in a first instance, to a start of the process step, and in a second instance, to an end for the process step;
- calculating statistics including rate of change for the first instances and second instances of aligned trace data for each process step;
- and
- generating a plurality of windows for the trace data from analysis of the calculated statistics for the aligned trace data.
A method for automatic window definition in the analysis of semiconductor equipment trace data, comprising:
- receiving trace data obtained from a plurality of semiconductor equipment sensors, the trace data associated with a plurality of steps in a semiconductor process;
- for each step of the semiconductor process:
- align the trace data associated with the step to the start of the step;
- calculate statistics including rate of change for the trace data aligned at the start of the step;
- align the trace data associated with the step to the end of the step;
- calculate statistics including rate of change for the trace data aligned at the end of the step;
- analyzing the calculated statistics for the trace data aligned at the start of the step and the trace data aligned at the end of the step;
- and
- computing windows for the trace data based on the analysis of the calculated statistics.
Dependencies are inferred from the claim text.