System and method for industrial scale continuous holographic lithography
AssigneePhotia Incorporated
InventorJoseph Bernhardt Geddes, III
Life of this patent
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Abstract
A system and method for patterning of a substrate at sub-micron length scales using interference lithography that includes a substrate; a chuck that promotes substrate motion; at least two EM beams; a beam phase controller, wherein the phase controller modifies phases of the EM beams with respect to each other creating an interference pattern; a displacement sensor that measures the substrate displacement; and a feedback control mechanism configured to monitor and synchronize the substrate motion with the interference pattern using the beam phase controller and the displacement sensor.
Claims12
A system for patterning of a substrate using interference lithography comprised of:
- an actuator that promotes motion of the substrate;
- at least two electromagnetic beams;
- a beam phase controller, wherein the phase controller modifies phases of the electromagnetic beams with respect to each other creating an interference pattern;
- a sensor that measures substrate motion;
- and
- a feedback control mechanism configured to monitor and synchronize motion of the substrate with the interference pattern using the beam phase controller and the sensor.
Dependencies are inferred from the claim text.