Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin (A),

• wherein the resin (A) includes a repeating unit having an acidic group, a repeating unit having an acid-decomposable group, and a repeating unit B1 derived from a monomer allowing a homopolymer formed therefrom to have a glass transition temperature of 50° C. or lower,
• the content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A),
• the content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A),
• the glass transition temperature of the resin (A) is 145° C. or lower,
• the actinic ray-sensitive or radiation-sensitive resin composition further comprises a photoacid generator which is a compound represented by General Formula (ZI-4) or General Formula (ZII):
• wherein in General Formula (ZI-4),
• l represents an integer of 0 to 2,
• r represents an integer of 0 to 8,
• R13 represents a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, or a group having a monocyclic or polycyclic cycloalkyl skeleton, provided that the groups other than the hydroxyl group may have a substituent,
• each R14 independently represents an alkyl group, a cycloalkyl group, an alkoxy group, an alkylsulfonyl group, a cycloalkylsulfonyl group, an alkylcarbonyl group, an alkoxycarbonyl group, or an alkoxy group having a monocyclic or polycyclic cycloalkyl skeleton, provided that these groups may have a substituent,
• each R15 independently represents an alkyl group, a cycloalkyl group, or a naphthyl group, provided that these groups may have a substituent, and further provided that two R15's may be bonded to each other to form a ring, and in a case where two R15's are bonded to form a ring, the ring skeleton may include a heteroatom, and
• Z− represents an anion,
• wherein in General Formula (ZII), R204 and R205 each independently represents an aryl group, an alkyl group, or a cycloalkyl group, provided that the aryl group of each of R204 and R205 may be an aryl group having a heterocyclic structure, and further provided that the aryl group, the alkyl group, and the cycloalkyl group of each of R204 and R205 may each independently have a substituent, and
• Z− represents an anion, and
• the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 μm or more.