Silicon optical modulator, method for making the same
AssigneeMarvell Asia Pte Ltd
InventorsXiaoguang Tu, Jie Lin, Masaki Kato
Life of this patent
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Abstract
A silicon optical modulator includes a silicon-on-insulator substrate and a first waveguide and a second waveguide arranged parallel to each other in the silicon-on-insulator substrate. The first waveguide includes a first PN junction. The second waveguide includes a second PN junction. At least one of the first PN junction and the second PN junction is disposed at an interface between a P type doped region and a N type doped region. The interface has an irregular shape that is not perpendicular to a plane in which the silicon-on-insulator substrate lies.
Claims15
An optical modulator comprising:
- a silicon-on-insulator substrate;
- and
- a first waveguide and a second waveguide arranged parallel to each other in the silicon-on-insulator substrate, the first waveguide comprising a first PN junction, the second waveguide comprising a second PN junction, wherein at least one of the first PN junction and the second PN junction is disposed at an interface between a P type doped region and a N type doped region, the interface having an irregular shape that is not perpendicular to a plane in which the silicon-on-insulator substrate lies, the at least one of the first PN junction and the second PN junction comprising a plurality of sections, a first set of the sections being doped with a P type material, and a second set of the sections being doped with an N type material.
An optical modulator comprising:
- a silicon-on-insulator substrate;
- and
- a first waveguide and a second waveguide arranged parallel to each other in the silicon-on-insulator substrate, the first waveguide comprising a first PN junction, the second waveguide comprising a second PN junction, at least one of the first PN junction and the second PN junction being disposed at an interface between a P type doped region and a N type doped region, the interface having an irregular shape that is not perpendicular to a plane in which the silicon-on-insulator substrate lies, the interface separating the P type doped region and the N type doped region being along an L-shaped line that is slanted relative to an axis perpendicular to the plane in which the silicon-on-insulator substrate lies.
An optical modulator comprising:
- a silicon-on-insulator substrate;
- and
- a first waveguide and a second waveguide arranged parallel to each other in the silicon-on-insulator substrate, the first waveguide comprising a first PN junction, the second waveguide comprising a second PN junction, at least one of the first PN junction and the second PN junction being disposed at an interface between a P type doped region and a N type doped region, the interface having an irregular shape that is not perpendicular to a plane in which the silicon-on-insulator substrate lies, the interface separating the P type doped region and the N type doped region being along a line that is slanted relative to an axis perpendicular to the plane in which the silicon-on-insulator substrate lies, each of the P type doped region and the N type doped region comprising a plurality of portions, each respective portion having a doping level that is different from at least one other portion of the same type.
An optical modulator comprising:
- a silicon-on-insulator substrate;
- and
- a first waveguide and a second waveguide arranged parallel to each other in the silicon-on-insulator substrate, the first waveguide comprising a first PN junction, the second waveguide comprising a second PN junction, at least one of the first PN junction and the second PN junction being disposed at an interface between a P type doped region and a N type doped region, the interface having an irregular shape that is not perpendicular to a plane in which the silicon-on-insulator substrate lies, the interface separating the P type doped region and the N type doped region being along a line that is slanted relative to an axis perpendicular to the plane in which the silicon-on-insulator substrate lies, the respective P type doped region and N type doped region comprising a plurality of portions having different depths and different doping levels compared to at least one other portion of the same type.
An optical modulator comprising:
- a silicon-on-insulator substrate;
- and
- a first waveguide and a second waveguide arranged parallel to each other in the silicon-on-insulator substrate, the first waveguide comprising a first PN junction, the second waveguide comprising a second PN junction, at least one of the first PN junction and the second PN junction being disposed at an interface between a P type doped region and a N type doped region, the interface having an irregular shape that is not perpendicular to a plane in which the silicon-on-insulator substrate lies, the interface separating the P type doped region and the N type doped region being along a line that is slanted relative to an axis perpendicular to the plane in which the silicon-on-insulator substrate lies, each P type doped region and each N type doped region comprising a plurality of portions with mutually different doping levels, and at least one of the portions in one of the P type doped region and the N type doped region overlapping with at least one of the portions in the other of the P type doped region and the N type doped region.
Dependencies are inferred from the claim text.