Electrical test of optical components via metal-insulator-semiconductor capacitor structures
AssigneeCisco Technology, Inc.
InventorsXunyuan Zhang, Ravi S. Tummidi, Tony P. Polous, Mark A. Webster
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Abstract
Electrical test of optical components via metal-insulator-semiconductor capacitor structures is provided via a plurality of optical devices including a first material embedded in a second material, wherein each optical device is associated with a different thickness range of a plurality of thickness ranges for the first material; a first capacitance measurement point including the first material embedded in the second material; and a second capacitance measurement point including a region from which the first material has been replaced with the second material.
Claims20
A system, including:
- a plurality of optical devices including a first material embedded in a second material, wherein each optical device of the plurality of optical devices is associated with a different thickness range of a plurality of thickness ranges for the first material, and wherein the first material comprises a semiconductor material;
- a first capacitance measurement point including the first material embedded in the second material;
- and
- a second capacitance measurement point including a region from which the first material has been replaced with the second material.
A method, comprising:
- forming a first layer of a first material;
- forming a second layer of a second material on the first layer;
- removing portions of the second layer to form a plurality of waveguides and a first measurement region of the second material in the second layer and a second measurement region that omits the second material;
- forming a third layer of the first material on the second layer, wherein forming the third layer fills the second measurement region with the first material;
- forming a first capacitance measurement point that includes the plurality of waveguides and the first measurement region;
- and
- forming a second capacitance measurement point that includes the plurality of waveguides and the second measurement region.
A method, comprising:
- determining a first capacitance at a first capacitance measurement point, wherein the first capacitance measurement point includes a first region of a first material at a given distance from a substrate, wherein a plurality of waveguides are made of the first material;
- determining a second capacitance at a second capacitance measurement point, wherein the second capacitance measurement point includes a second region of a second material at the given distance from the substrate shared with the plurality of waveguides made of the first material;
- determining a thickness of the first region based on the first capacitance and the second capacitance;
- and
- defining an optical pathway through a subset of waveguides of the plurality of waveguides, wherein the subset of waveguides is associated with optical characteristics corresponding to the thickness.
Dependencies are inferred from the claim text.