Encapsulated cleanroom system
AssigneeNational Institute of Advanced Industrial Science and Technology
InventorsShiro Hara, Hitoshi Maekawa, Sommawan Khumpuang, Takashi Yajima, Yuuki Ishida
Life of this patent
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Abstract
An encapsulated cleanroom system comprising a processing chamber and a storage section in which the processing chamber is stored, wherein, during operation, the pressure in the storage section is lower or higher than the pressures in the processing chamber and exterior space. The system can simultaneously prevent the entry of outside gases into its processing chamber and the leakage of the gases inside the processing chamber to the exterior space.
Claims7
An encapsulated cleanroom system comprising a processing chamber and a storage section in which the processing chamber is stored, characterized in that, during operation, a pressure in the storage section is lower or higher than pressures in the processing chamber and exterior space,
- wherein clean gases are supplied to the processing chamber and, during operation, the pressure in the storage section is lower than the pressures in the processing chamber and exterior space.
An encapsulated cleanroom system comprising a processing chamber and a storage section wherein the storage section surrounds a circumference of the processing chamber along a direction of clean gases flow in the processing chamber, and, during operation, a pressure in the storage section is lower or higher than pressures in the processing chamber and exterior space,
- wherein clean gases are supplied to the storage section and, during operation, the pressure in the storage section is higher than the pressures in the processing chamber and exterior space.
An encapsulated cleanroom system comprising:
- a processing chamber serving as a cleanroom wherein an enclosure of the processing chamber defining an operation interior is gas-leakable;
- a storage compartment encapsulating the processing chamber wherein an enclosure of the storage compartment defining an intermediate interior surrounding the processing chamber is gas-leakable;
- a gas supply structure supplying an in-flow gas from the ambient space exterior to the storage compartment to the processing chamber, wherein the intermediate interior is a space isolated from the operation interior by partition walls of the processing chamber, and the in-flow gas is supplied from the operation interior to the intermediate interior through the partition walls of the processing chamber;
- a gas exhaust structure discharging an out-flow gas from the processing chamber and the storage compartment, wherein the gas exhaust structure is constituted by a first gas line connecting the operation interior to a gas exhaust port, and a second gas line connecting the intermediate interior to the gas exhaust port, wherein a flow-restriction valve is provided in the first gas line to discharge a gas from the intermediate interior in an amount higher than an amount of a gas discharged from the operation interior, so that the pressure of the intermediate interior is lower than the pressure of the operation interior as well as the pressure of the ambient space exterior to the storage compartment;
- and
- a gas-flow controller controlling flow of the in-flow gas and/or the out-flow gas in a manner that a pressure of the intermediate interior is lower than a pressure of the operation interior as well as a pressure of ambient space exterior to the storage compartment, or the pressure of the intermediate interior is higher than the pressure of the operation interior as well as the pressure of ambient space exterior to the storage compartment, thereby suppressing a gas of the operation interior from being discharged to the ambient space or suppressing a gas of the ambient space entering into the operation interior.
Dependencies are inferred from the claim text.