Back to results
US 11,685,996 B2Granted
Atomic layer deposition device
AssigneeSky Tech Inc.
InventorJing-Cheng Lin
Life of this patent
Estimating the term…
Abstract
An atomic layer deposition device is disclosed. The atomic layer deposition device includes a chamber, a precursor inlet, a heater, a support unit, a hollow component, and a baffle. When the heater and the support unit are driven by a lifting device to approach the hollow component, the support unit and the baffle surround and set bounds to a reaction space, so that the flow field of the process fluid, such as precursor or purge gas, can be adjusted stably to make a uniform deposition on the substrate.
Claims20
An atomic layer deposition device comprising:
- a chamber, comprising a containing space;
- a precursor inlet, fluidly connected to the containing space of the chamber, for transporting at least one precursor to the containing space;
- a heater, disposed in the containing space of the chamber and comprising a top surface;
- a support, disposed on the top surface of the heater, for supporting at least one substrate;
- at least one hollow component, comprising at least one exhaust hole and fluidly connected to the containing space of the chamber,
- wherein the hollow component is disposed above the support;
- and
- a baffle, disposed above the support and surrounding the hollow component, and the baffle comprising a block portion and a contact portion;
- wherein the baffle is connected to the chamber or the hollow component, and when the baffle moves downward due to gravitational force, the block portion retains the baffle to the chamber or the hollow component.
6 more elements
An atomic layer deposition device comprising:
- a chamber, comprising a containing space;
- a precursor inlet, fluidly connected to the containing space of the chamber, for transporting at least one precursor to the containing space;
- a heater, disposed in the containing space of the chamber and comprising a top surface;
- a support, disposed on the top surface of the heater, for supporting at least one substrate;
- at least one hollow component, comprising at least one exhaust hole and fluidly connected to the containing space of the chamber, wherein the hollow component is disposed above the support;
- a baffle, disposed above the support and surrounding the hollow component, the baffle comprising a block portion and a contact portion;
- and
- a motor, connected to the block portion of the baffle for driving the baffle to move vertically.
5 more elements
Dependencies are inferred from the claim text.