Process for producing flexible organic-inorganic laminates
AssigneeBASF Coatings GmbH
InventorsMaraike Ahlf, Felix Eickemeyer, Daniel Loeffler, Stephan Klotz, Juergen Frank, Myung Mo Sung, Kwan Hyuck Yoon
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Abstract
The present invention is in the field of processes for producing flexible organic-inorganic laminates as well as barrier films comprising flexible organic-inorganic laminates by atomic layer deposition. In particular the present invention relates to a process for producing a laminate comprising more than once the sequence comprising: (a) depositing an inorganic layer by performing 4 to 150 cycles of an atomic layer deposition process, and (b) depositing an organic layer comprising sulfur by a molecular layer deposition process.
Claims20
A laminate comprising, more than once, a sequence comprising
- (a) an inorganic layer of a (semi)metal oxide, elemental (semi)metal or (semi)metal nitride having a thickness of 0.4 to 3 nm and
- (b) an organic layer consisting of S and one or more elements selected from the group consisting of C, H, O, N, Se and P,
- wherein the laminate has a water vapor transmission rate (WVTR) of less than 10−2 g/m2d when dried at 70% relative humidity at 70° C. for 480 h and bent with a radius of 1.5 cm.
A laminate comprising, more than once, a sequence comprising:
- (a) an inorganic layer of a (semi)metal oxide, elemental (semi)metal or (semi)metal nitride having a thickness of 0.4 to 3 nm and
- (b) an organic layer consisting of S and one or more elements selected from the group consisting of C, H, O, N, Se and P obtained with an organic thiol comprising one or more hydroxyl groups.
Dependencies are inferred from the claim text.