Textured processing chamber components and methods of manufacturing same
AssigneeApplied Materials, Inc.
InventorsCariappa Baduvamanda, Ong Pang Yen, Lit Ping Lam
Life of this patent
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Abstract
Processing chamber components and methods of manufacture of same are provided herein. In some embodiments, a component part body includes a component part body having a base plane and at least one textured surface region, wherein the at least one textured surface region comprises a plurality of independent surface features having a first side having at least a 45 degree angle with respect to the base plane. In at least some embodiments, the textured surface includes a plurality of independent surface features which are pore free.
Claims18
A chamber component for a processing chamber, comprising:
- a coil spacer for a processing chamber having a base plane and at least one textured surface region perpendicular to the base plane,
- wherein the at least one textured surface region comprises a plurality of independent surface features extending axially outward from and equally spaced on an external surface of the coil spacer and having a first side with a linear edge closest to the base plane that forms at least a 45 degree to approximately 75 degree angle with respect to the base plane, and wherein the base plane is configured to be parallel to an outer vertical shield of a process volume of a plasma vapor deposition (PVD) chamber when the coil spacer is installed in the PVD chamber,
- wherein the at least one textured surface region of the coil spacer is a curved surface connecting a wider base plane to a narrower top plane and the independent surface features all have their first side linear edge parallel to each other and all forming an angle between 45 to approximately 75 degrees with the base plane.
A coil spacer for a processing chamber, comprising:
- a top portion;
- a bottom portion;
- an opening disposed in the top portion and extending through the bottom portion, wherein the top portion is configured to receive a tab of an inductive coil of a plasma vapor deposition (PVD) chamber and wherein the bottom portion is configured to receive a tab receptor for the inductive coil of the PVD chamber;
- an exterior surface;
- an interior surface disposed adjacent the opening;
- and
- a cup region disposed between the top portion and bottom portion, wherein the cup region has an exterior portion, wherein at least one textured surface region is perpendicular to a base plane of the coil spacer and is disposed upon the exterior portion of the cup region, wherein the at least one textured surface region comprises a plurality of independent surface features extending axially outward from and equally spaced on the exterior surface and having a first side with a linear edge closest to the base plane that forms at least a 45 degree to approximately 75 degree angle with respect to the base plane, wherein the base plane extends as a plane across the bottom portion, and wherein the base plane is configured to be parallel to an outer vertical shield of a process volume of the PVD chamber when the coil spacer is installed in the PVD chamber,
- wherein the at least one textured surface region of the coil spacer is a curved surface connecting a wider bottom portion to a narrower top portion and the independent surface features all have their first side linear edge parallel to each other and all forming an angle between 45 to approximately 75 degrees with the base plane.
Dependencies are inferred from the claim text.