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US 11,685,657 B2Granted
Covalent organic framework patterning on substrates
AssigneeUniversity of Pittsburgh—Of the Commonwealth System of Higher Education
InventorsAlexander Star, David White
Life of this patent
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Abstract
A method of forming a pattern in a substrate material includes positioning a layer of a covalent organic framework polymer including nanoscale holes or pores therein over the substrate material as a template having nanoscale holes or pores therein to form a templated assembly and applying an etching process to the templated assembly.
Claims22
A method of forming a pattern in a substrate material, comprising:
- positioning a layer of a covalent organic framework polymer comprising nanoscale pores therein over the substrate material as a template having nanoscale pores therein to form a templated assembly;
- and
- applying an etching process to the templated assembly to etch through the covalent organic framework polymer to form the pattern in the substrate material.
A composition comprising a graphitic substrate material comprising an etched pattern formed by the process of:
- depositing a layer of a covalent organic framework polymer comprising nanoscale pores on the graphitic substrate material as a template, the covalent organic framework polymer having an average pore size in the range of 0.7 nm to 4.7 nm and an average neck width of no greater than 5 nm, to form a templated assembly;
- and
- applying an etching process to the templated assembly to form the etched pattern through the layer of the covalent organic framework polymer and in the graphitic substrate material, wherein the etched pattern comprises a pattern of holes through the graphitic substrate material such that an average neck width of no greater than 5 nm is formed in the etched pattern.
Dependencies are inferred from the claim text.