Micro-electromechanical system and method for producing same
AssigneeLynred
InventorSylvain Lemettre
Life of this patent
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Abstract
A method of manufacturing a microelectromechanical system includes forming of an electromechanical element on a substrate. The method further includes preparation of an encapsulation package to form a sealed cavity integrating the electromechanical element, with the sealed cavity having a volume smaller than 10 mm3. The method includes physical vapor deposition of a getter film on the substrate or on a wall of the encapsulation package so that the getter film has a specific absorption surface area smaller than 8 m2/g, and sealing of the encapsulation package on the substrate by means of a thermal sealing cycle having a temperature enabling to activate said getter film.
Claims11
A method of manufacturing a microelectromechanical system, comprising the following steps:
- forming of an electromechanical element on a substrate;
- preparation of an encapsulation package to form a sealed cavity integrating said electromechanical element, said sealed cavity having a volume smaller than 10 mm3;
- physical vapor deposition of a getter film on said substrate or on a wall of the encapsulation package so that the getter film has a specific absorption surface area smaller than 8 m2/g;
- the getter film being deposited on the substrate in the absence of any previous cleaning of said substrate involving a noble gas;
- and
- sealing of the encapsulation package on the substrate by means of a thermal sealing cycle having a temperature enabling to activate the getter film.
A microelectromechanical system comprising:
- a substrate supporting an electromechanical element;
- an encapsulation package attached to said substrate to form a sealed cavity integrating said electromechanical element;
- and
- a getter film deposited in the sealed cavity on said substrate or on a wall of said encapsulation package;
- wherein
- the sealed cavity has a volume smaller than 10 mm3;
- and the getter film has a specific absorption surface area smaller than 8 m2/g;
- the getter film being deposited on the substrate in the absence of any previous cleaning of said substrate involving a noble gas.
Dependencies are inferred from the claim text.