Apparatus for treating substrate
AssigneeSemes Co., Ltd.
InventorCheol Hwan Jeong
Life of this patent
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Abstract
Embodiments of the inventive concept provides an apparatus for treating a substrate. The apparatus for treating a substrate comprises a housing having a process space therein, a substrate support unit supporting a substrate in the space, a liquid supply unit supplying a liquid to a substrate supported by the substrate support unit, an air flow generation unit generating an air flow in the process space, and the air flow generation unit comprises a first gas supply unit supplying a descending air flow of a first gas in the process space and a second gas supply unit supplying a second gas having lower humidity than the first gas in the space, and when viewed from above, the first gas supply unit and the second gas supply unit are not overlapped each other.
Claims19
An apparatus for treating a substrate, the apparatus comprising:
- a housing having a process space therein;
- a substrate support unit supporting a substrate in the process space;
- a liquid supply unit supplying a liquid to a substrate supported by the substrate support unit;
- and
- an air flow generation unit generating an air flow in the process space,
- wherein the air flow generation unit comprises:
- a first gas supply unit supplying a descending air flow of a first gas in the process space;
- a second gas supply unit supplying a second gas having lower humidity than the first gas in the process space,
- wherein, when viewed from above of the housing, the first gas supply unit and the second gas supply unit are not overlapped with each other, and
- wherein the second gas supply unit comprises a first introduction port and a second introduction port disposed on opposing sidewalls of the housing and on opposing sides of the first gas supply unit, the first introduction port facing the second introduction port such that the first introduction port and the second introduction port introduce the second gas toward each other in the housing.
An apparatus for treating a substrate, the apparatus comprising:
- a housing having a process space therein;
- a substrate support unit supporting a substrate in the process space;
- a liquid supply unit supplying a liquid to the substrate supported by the substrate support unit;
- an air flow generation unit generating an air flow in the process space,
- wherein the air flow generation unit comprises:
- a first gas supply unit supplying a first gas to the substrate;
- and
- a second gas supply unit supplying a second gas having lower humidity than the first gas to the substrate,
- wherein an air flow direction of the first gas is different from an air flow direction of the second gas, and
- wherein the second gas supply unit comprises a first introduction port and a second introduction port disposed on opposing sidewalls of the housing and on opposing sides of the first gas supply unit, the first introduction port facing the second introduction port such that the first introduction port and the second introduction port introduce the second gas toward each other in the housing.
An apparatus for treating a substrate, the apparatus comprising:
- a housing having a process space therein;
- a substrate support unit supporting a substrate in the process space;
- a liquid supply unit supplying a liquid to a substrate supported by the substrate support unit;
- an air flow generation unit generating an air flow in the process space,
- wherein the air flow generation unit comprises:
- a first gas supply unit supplying a descending air flow of a first gas in the process space;
- and
- a second gas supply unit supplying a second gas having lower humidity than the first gas in the process space,
- wherein the first gas is supplied directly to the substrate,
- wherein the second gas is supplied indirectly to the substrate, and
- wherein the second gas supply unit comprises a first introduction port and a second introduction port disposed on opposing sidewalls of the housing and on opposing sides of the first gas supply unit, the first introduction port facing the second introduction port such that the first introduction port and the second introduction port introduce the second gas toward each other in the housing.
Dependencies are inferred from the claim text.