Method for enhancing the semiconductor manufacturing yield
AssigneeASML Netherlands B.V.
InventorWei Fang
Life of this patent
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Abstract
Embodiments of the present disclosure provide systems and methods for enhancing the semiconductor manufacturing yield. Embodiments of the present disclosure provide a yield improvement system. The system comprises a training tool configured to generate training data based on receipt of one or more verified results of an inspection of a first substrate. The system also comprises a point determination tool configured to determine one or more regions on a second substrate to inspect based on the training data, weak point information for the second substrate, and an exposure recipe for a scanner of the second substrate.
Claims17
A yield improvement system comprising:
- a training tool configured to generate training data based on receipt of one or more verified results of an inspection of a first substrate;
- and
- a point determination tool configured to determine one or more regions on the second substrate to be inspected, based on the training data, weak point information for a second substrate, and an exposure recipe for the second substrate, wherein the exposure recipe for the second substrate is an exposure recipe of a scanner to expose the second substrate to a pattern,
- wherein the one or more verified results are generated based on a comparison of one or more monitored results of the first substrate with one or more design parameters, and wherein the one or more monitored results are generated based on at least one of a pattern size measurement and a pattern shift measurement.
A method comprising:
- receiving one or more verified results of an inspection of a first substrate;
- generating training data based on the received verified results;
- and
- determining one or more regions on the second substrate to be inspected, based on the training data, weak point information for a second substrate, and an exposure recipe for the second substrate, wherein the exposure recipe for the second substrate is an exposure recipe of a scanner to expose the second substrate to a pattern,
- wherein the one or more verified results are generated based on a comparison of one or more monitored results of the first substrate with one or more design parameters, and wherein the one or more monitored results are generated based on at least one of a pattern size measurement and a pattern shift measurement.
A non-transitory computer readable storage medium storing instructions that are executable by a computing device that includes one or more processors to cause the computing device to perform a method comprising:
- receiving one or more verified results of an inspection of a first substrate;
- generating training data based on the received verified results;
- determining one or more regions on the second substrate to be inspected, based on the training data, weak point information for a second substrate, and an exposure recipe for the second substrate, wherein the exposure recipe for the second substrate is an exposure recipe of a scanner to expose the second substrate to a pattern,
- wherein the one or more verified results are generated based on a comparison of one or more monitored results of the first substrate with one or more design parameters, and wherein the one or more monitored results are generated based on at least one of a pattern size measurement and a pattern shift measurement.
Dependencies are inferred from the claim text.